Neodymium Fluoride Sputtering Target

Description

Neodymium Fluoride Sputtering Target is a material used in the process of sputtering for depositing thin films onto a substrate. Neodymium fluoride is a compound composed of neodymium (Nd) and fluorine (F) ions. In the sputtering process, high-energy ions bombard the surface of the neodymium fluoride sputtering target, causing atoms or molecules to be ejected. These ejected particles then deposit onto a substrate, forming a thin film with properties inherited from the target material.

Sputtering targets come in different shapes and sizes based on the requirements of the thin film deposition process and the sputtering equipment used. The choice of a neodymium fluoride sputtering target depends on the desired properties of the thin film and its intended applications, which may include optics, electronics, or other advanced materials.

Neodymium Fluoride Sputtering Target Specifications

Neodymium Fluoride Sputtering Target Handling Notes

1. Indium bonding is recommended for Neodymium Fluoride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity, and is susceptible to thermal shock.

Neodymium Fluoride Sputtering Target Application

• Optical Coatings: Neodymium Fluoride thin films are used in optics for anti-reflective coatings and interference filters.
• Semiconductor Manufacturing: the fabrication of certain electronic and optoelectronic devices.
• Research and Development: Neodymium fluoride thin films may be used in various research and development applications

Neodymium Fluoride Sputtering Target Packaging

Our Neodymium Fluoride Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.