Lithium Zinc Oxide Sputtering
Target Description
Lithium Zinc Oxide Sputtering Target is a specific material used in the process of sputtering, which is a technique used in thin film deposition for various applications such as electronics, optics, and coatings.
The sputtering target is made up of lithium zinc oxide (LiZnO), a compound composed of lithium (Li), zinc (Zn), and oxygen (O). It is typically in the form of a solid disc-shaped material with a high purity.
During the sputtering process, a high-energy plasma is created in a vacuum chamber, and ions in the plasma bombard the sputtering target. This bombardment causes atoms from the target material to be ejected or sputtered onto a substrate, creating a thin film coating.
Lithium Zinc Oxide Sputtering Target Specifications
|
Compound Formula |
Li:ZnO |
|
Molecular Weight |
88.33 |
|
Appearance |
White Target |
|
Density |
4.59 g/cm3 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Lithium Zinc Oxide Sputtering Target Handling Notes
- Indium bonding is recommended for Lithium Zinc Oxide Sputtering Targets, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity and is susceptible to thermal shock.
Lithium Zinc Oxide Sputtering Target Application
- Transparent Conductive Oxide (TCO) Films
- Solar Panels
- Gas Sensors
- Electrochromic Devices
- Photoelectrochemical Water Splitting
- Anti-Reflection Coatings
- Flexible Electronics
Lithium Zinc Oxide Sputtering Target Packaging
Our Lithium Zinc Oxide Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.