Iron Gallium Sputtering Target Description
Iron Gallium Sputtering Target is a specialized material used in the process of sputtering, which is a method commonly used in thin-film deposition. It consists of a high-purity mixture of iron and gallium.
Iron Gallium Sputtering Target is specifically used in applications where a thin film of iron-gallium alloy is required. This alloy exhibits magnetic properties, making it ideal for applications in the field of magneto-electronics, such as magnetic sensors, magnets, data storage devices, and spintronics.
Iron Gallium Sputtering Target Specifications
|
Compound Formula |
Fe/Ga |
|
Appearance |
Gray metallic target |
|
Molecular Weight |
140.773 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Iron Gallium Sputtering Target Handling Notes
- Indium bonding is recommended for Iron Gallium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity, and is susceptible to thermal shock.
Iron Gallium Sputtering Target Application
Iron Gallium Sputtering Target is specifically used in applications where a thin film of iron-gallium alloy is required. This alloy exhibits magnetic properties, making it ideal for applications in the field of magneto-electronics, such as magnetic sensors, magnets, data storage devices, and spintronics.
Iron Gallium Sputtering Target Packaging
Our Iron Gallium Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.