Calcium Manganate Sputtering
Target Description
Calcium Manganate Sputtering Target is a type of thin film deposition material used in the process of physical vapor deposition (PVD). PVD is a method of depositing thin films of material onto a substrate by bombarding a solid target with high-energy particles in a vacuum chamber.
Calcium Manganate Sputtering Target consists of a solid disc made of a compound composed of calcium (Ca) and manganate (MnO3). The target is typically made by compressing and sintering powdered calcium manganate.
Calcium Manganate Sputtering Target Specifications
|
Compound Formula |
CaMnO3 |
|
Appearance |
White target |
|
Molecular Weight |
143.01 |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Calcium Manganate Sputtering Target Handling Notes
- Indium bonding is recommended for Calcium Manganate Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
- This material has a low thermal conductivity, and is susceptible to thermal shock.
Calcium Manganate Sputtering Target Application
Calcium Manganate Sputtering Target is used in the production of Copper Indium Gallium Selenide (CIGS) solar cells, which are thin film photovoltaic devices. CIGS solar cells have high efficiency and are flexible, making them suitable for various applications such as building-integrated photovoltaics.
Calcium Manganate Sputtering Target Packaging
Our Calcium Manganate Sputtering Targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.