HPT-300 & HPT-500
HPT-300 및 HPT-500은 마이크로프로세서 제어 방식의 벤치탑 플라즈마 처리 시스템으로, 고분자, 금속, 유리, 세라믹 등 다양한 소재의 표면 활성화와 클리닝, 표면개질에 이상적인 장비입니다.
싱글 또는 이중 가스 주입 버전과 온보드 가스믹싱 매니폴드를 갖춘 HPT-300/500 시스템은 공기, 산소, 수소, 아르곤, 질소 등 다양한 가스를 사용하여 최적화된 표면처리를 수행합니다.
옵션인 사양인 vapor inlet이 있어 액체 전구체까지 사용할 수 있으며, 부식 방지 버전은 다음과 같은 특정 소재의 처리에 적용할 수 있어, 선택의 폭이 넓습니다;
- Plasma cleaning
- Plasma surface activation to improve adhesion
- Functional plasma coatings
- Plasma etching
- PDMS & microfluidic devices
- PEEK & other engineering polymers
- PTFE
- Metals
- Ceramics
- Glass & optical devices
PROCESS RESULTS
TFT Colour touchscreen
Each system is supplied with a 5.7" colour touchscreen provides a rich, user-friendly interface. Variables such as gas flow rate, pressure, power level and plasma processing time can be freely set and then stored to produce a fully interlocked process cycle from a single keypress. A handy status display and end of process audible alarm informs the user of every step in the process.
Surface Activation Example
- Material : PEEK
- Oxygen Plasma
- 60 seconds
Before plasma treatment![]()
After plasma treatment![]()
PLASMA ENVIRONMENT
Vacuum chamber & power
The HPT-300 system features a 200mm x 200mm (~12.5L) rectangular plasma process chamber in stainless steel with vacuum compatible materials throughout.
The HPT-500 feature a 240 x 240mm (~23L) rectangular plasma process chamber respectively. Both models feature removable parts/carrier trays which allow treatment of larger parts or many more smaller parts per batch.
Our proprietary, high stability HPS plasma generator is continuously variable over the entire 0-300W power range rather than being limited to discreet levels, delivering much finer control when processing delicate materials.
BENEFITS
Versatility
The base model of each system has a single gas inlet and optional second gas or vapour delivery inlet. The units can be prepared so that either option can be added at a later time if required, ensuring that future requirements can be accommodated without expensive reconfiguration.
Repeatable and Reliable
With precision digital mass flow controllers and integrated pressure gauge, the HPT-300 & 500 models deliver unmatched reliability and repeatability by removing common errors in gas flow and gas type settings which will be familiar to users of equivalent equipment that utilise manual needle valves.
BENEFITS
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SPECIFICATION
Technical Specifications |
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HPT-300 / HPT-500 Plasma Treatment Systems |
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ENCLOSURE |
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Dimensions |
HPT-300 - W 533mm x H 466mm x L 615mm (+50mm on rear for cables) HPT-500 - W 533mm x H 600mm x L 615mm (+50mm on rear for cables) |
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Weight |
HPT-300 - ~40kg HPT-500 - ~45kg |
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CHAMBER |
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Material |
Stainless Steel |
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Form |
Rectangular |
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Dimensions |
HPT-300 - 200mm W x 200mm H x 320mm L HPT-500 - 240mm W x 240mm H x 405mm L |
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REMOVABLE PARTS CARRIER |
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Material |
Aluminium |
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Material options |
Stainless steel |
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Form |
Flat tray |
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Options |
Multi-level shelf/electrode |
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Dimensions |
HPT-300 - 190mm W x 310mm L, others to suit application HPT-500 - 200mm W x 370mm L, others to suit application |
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PLASMA POWER SUPPLY |
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Power |
HPT-300 - 0-250W, continuously variable output HPT-500 - 0-300W, continuously variable output |
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Frequency |
40 kHz |
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PROCESS CONTROL |
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Interface |
5.7” Colour TFT with recipe store |
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Gas channels |
x1 MFC |
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Gas channel options |
x2 MFC or x1 MFC and x1 vapour inlet |
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Vent inlet |
x1 |
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Vent inlet options |
soft ventilation option |
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Connections |
6mm compression or 1/4" compression |
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Process timer |
1sec – 99.59min |
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Recipe store |
Stores up to 4 x recipes with individual parameters |
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Pressure gauge |
Pirani sensor |
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Vacuum pump |
6 to 15 m3/hr pumping speed |
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Vacuum pump options |
2-stage rotary pump (air/inert gas), PFPE rotary pump (oxygen compatible), dry pumps. All pumps include exhaust filter and connections |
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SERVICES |
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Electrical |
90-250 VAC, 50-60Hz, 1200-1500 VA (including pump), fused 6.3 A T / 10 A T |
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Power cord |
Suited to region |
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Compliance |
CE – UKCA - ROHS - WEEE |
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**Henniker strive for continuous improvement and specifications are subject to change without notic |
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