Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
Molybdenum Niobium Alloy Planar Target
Molybdenum Niobium Alloy Planar Target
Description
Stanford Advanced Materials (SAM) supplies Molybdenum-Niobium (MoNb) alloy planar targets engineered for high-performance thin-film deposition. Typically made with 90% molybdenum and 10% niobium, this alloy combines molybdenum’s high thermal and electrical conductivity with niobium’s added strength and corrosion resistance.
Targets are available in a range of purity grades (99.9% to 99.999%) and formats, including plates, discs, and custom shapes to fit various sputtering systems. The niobium content improves resistance to oxidation and alkali corrosion, making MoNb well-suited for demanding deposition environments.
With tight grain control and uniform alloying, SAM’s MoNb targets support strong adhesion and consistent film quality. Each target is produced under strict quality control and can be tailored to meet specific application or equipment requirements.
Molybdenum Niobium Alloy Planar Target Specification
Properties
|
Grade |
Density (g/cm³) |
Avg. Grain Size (μm) |
Surface Roughness (μm) |
Straightness (mm) |
Bonding Rate (%) |
|---|---|---|---|---|---|
|
MoNb5 |
≥10.00 |
≤100 |
≤0.8 |
≤0.30 |
≥97 |
|
MoNb10 |
≥9.90 |
≤100 |
≤0.8 |
≤0.30 |
≥97 |
Chemical Composition. %
|
Chemical Composition |
MoNb5 |
MoNb10 |
|
|
Main Content, %, min
Mo |
Mo |
94.85-95.05 |
89.85-90.05 |
|
Nb |
5.00±0.1 |
10.00±0.1 |
|
|
Impurity Content (mass fraction),
%, max |
Al |
0.0050 |
0.0050 |
|
Cr |
0.0050 |
0.0050 |
|
|
Cu |
0.0050 |
0.0050 |
|
|
Fe |
0.0100 |
0.0100 |
|
|
Ni |
0.0050 |
0.0050 |
|
|
Si |
0.0060 |
0.0060 |
|
|
C |
0.0150 |
0.0150 |
|
|
O |
0.0800 |
0.0800 |
|
|
N |
0.0300 |
0.0300 |
|
*The above product information is based on theoretical data. For specific requirements and detailed inquiries, please get in touch with us.
Molybdenum Niobium Alloy Planar Target Applications
-
Flat Panel Displays & Touch Panels – Improves electrode layer performance and adhesion in TFT-LCD and OLED manufacturing.
-
Semiconductors & Microelectronics – Used as a barrier or adhesion layer in ICs and other microelectronic devices.
-
Optical Coatings – Adds durability and clarity to anti-reflective and functional optical films.
-
Thin-Film Solar Cells (CIGS) – Provides stable back contacts for efficient energy conversion.
-
Corrosion-Resistant Coatings – Performs well in high-alkali and oxidative environments.
Molybdenum Niobium Alloy Planar Target Packaging
Packaging is based on product size and type:
- Small targets: PP boxes
- Large/custom targets: Protective wooden crates
All packages include appropriate cushioning and sealing to prevent damage during transit.
Manufacturing Process
1. Brief Manufacturing Process Flow
2. Testing Method
-
Chemical Analysis – Verified by GDMS or XRF
-
Mechanical Testing – Tensile, yield, and elongation measurements
-
Dimensional Inspection – Ensures target thickness, width, and length are within spec
-
Surface Quality Check – Detects cracks, voids, and inclusions via visual and ultrasonic tools
-
Hardness Testing – Confirms consistency and mechanical reliability
Molybdenum Niobium Alloy Planar Target FAQs
Q1: Why use MoNb instead of pure molybdenum?
A1: Niobium improves corrosion resistance, oxidation resistance, and mechanical durability, especially in high-temperature or chemically aggressive environments.
Q2: Where are MoNb planar targets used?
A2: In display tech, semiconductors, optics, solar cells, and any environment needing stable, corrosion-resistant films.
Q3: How should MoNb targets be stored?
A3: Store in a clean, dry space. Avoid contact with moisture and handle carefully to prevent contamination or surface damage.
Performance Comparison Table with Competitive Products
Molybdenum Niobium Rotary Target vs. Molybdenum Niobium Planar Target
|
Feature |
Rotary Target |
Planar Target |
|---|---|---|
|
Material Use |
80–90% |
30–40% |
|
Service Life |
Longer |
Shorter |
|
Film Uniformity |
High, good for large areas |
May vary across surface |
|
Cost Efficiency |
Higher initial, better ROI |
Lower upfront, more changes |
|
Applications |
Displays, solar, optics |
Chips, sensors, small areas |
|
Sputter Stability |
High |
Lower |
|
Equipment |
Rotary sputtering systems |
Planar sputtering systems |
Material Background
Molybdenum (Mo)
-
High melting point (2,617°C)
-
Strong thermal and electrical conductivity
-
Good corrosion resistance
-
Common in coatings, electronics, energy systems, and structural alloys
Niobium (Nb)
-
Melting point: 2,477°C
-
Strong oxidation and alkali resistance
-
Excellent mechanical strength
-
Used in superconductors, aerospace alloys, and chemical-resistant components
The MoNb alloy benefits from the best of both elements: thermal and electrical performance from molybdenum, mechanical resilience and corrosion resistance from niobium.
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