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MBE, Molecular Beam Epitaxy System

Dr. Eberl MBE-Komponenten GmbH, Germany

Trusted expertise since 1990

35 years of development and manufacture of complex systems and components for multiple tasks

Source Clusters

DCS, Dual Cluster Source

The use of source clusters increases the capacity of your UHV-System, by using only a single port for two individual sources.

DCS 40-2x1-14-2S Dual Cluster Source on a DN40CF (O.D. 2.75'') flange with two individual shutters and integrated water cooling
  • Cluster sources increase the capacity of UHV systems
  • Customized with two independent and different types of effusion cells on a single flange
  • Two individual shutters or multi-position shutter and additional cool tube available
  • Minimized temperature crosstalk because of effective integrated water cooling
  • Various crucible types and sizes available
  • Very compact cell design
  • Surprisingly low power consumption

 

 

QCS, Quad Cluster Source

Quad Cluster Sources are designed as four-cell-clusters. They can add more sources to your MBE system, either as thin-film deposition source in nanosciences or as doping source.

QCS 40-4x1-12 Quad Cluster Source on DN40CF flange with multi-position rotary shutter

 
  • Source clusters increase the capacity of MBE systems
  • 4 cells on one DN40CF (2.75") flange or DN63CF (4.5") flange
  • Very compact cell design
  • Various crucible types and sizes available
  • Integrated water cooling
  • Multi-position shutter for QCS 40 and QCS 63

 

DDS, Dual Doping Source

DDS 63-2x2-16-2S Dual Doping Source for Si and Be on one DN63 CF flange, with two 2 cm3 crucibles, individual cell shutters and water cooling shield between the cells

 
  • Cluster sources increase the capacity of UHV systems
  • Customized designs with all kind of effusion cells
  • Compact and intelligent cell design
  • Various crucibles available
  • Solutions with integrated cooling shrouds and shutters

 

Customized Source Clusters, Individual and particular cases

Because of the large variety of different UHV systems each cluster is individually designed.

Special 90° source cluster with two individual linear shutters, mounted on a DN100CF flange.

 
  • Large variety of particular case sources available
  • Customized solutions with special designs
  • Close collaboration with customers
  • Consideration of special customomers' needs
  • Manifacturing of every practicable request


 

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MBE Components Source Clusters DCS, Dual Cluster Source The use of source clusters increases the capacity of your UHV-System, by us
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