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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 허용 오차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


NITRIDE TARGET

Europium Nitride Sputtering Target, EuN

 

 

Europium Nitride Sputtering Target

Description

Europium Nitride Sputtering Targets provided by Stanford Advanced Materials (SAM) are precision prepared with excellent high purity, which helps to achieve pure and uniform deposition of thin films. The magnetic properties imparted by the element europium make it excellent in the preparation of magnetic materials for applications such as magnetic storage and magnetic sensors. EuN is chemically stable, providing reliability for thin film deposition, and is suitable for long-term experiments and applications. High conductivity ensures uniform deposition during sputtering, improving film uniformity and performance. Europium Nitride Sputtering Targets are widely used in optical films, magnetic films, and electronic components, providing critical material support for high-tech applications.

 

 

Europium Nitride Sputtering Target Specifications

Compound Formula

EuN

Molecular Weight

165.97

Appearance

Black Target

Melting Point

Density

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

 

Europium Nitride Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Europium Nitride Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

 

Europium Nitride Sputtering Target Application

  1. Optical Thin Film Technology: Used in the preparation of optical thin films such as reflector sheets and optical coatings to provide high-performance coatings for lasers and other optical devices.
  2. Magnetic thin film applications: Due to their magnetic properties, Europium Nitride Sputtering Targets play a key role in magnetic storage, magnetic sensors, and magnetic component preparation.
  3. Electronic Component Manufacturing: Used in the preparation of thin films for electronic components such as magnetoresistors, magneto-electric sensors, etc. to improve the performance of electronic components.
  4. Magneto-optical storage technology: Applied in the field of magneto-optical storage, supporting the preparation of high-density and high-performance magnetic storage media.
  5. Magnetic navigation systems: In the manufacture of magnetic sensors for magnetic navigation systems, Europium Nitride Sputtering Targets ensure the sensitivity and accuracy of the sensors.

 

Europium Nitride Sputtering Target Packaging

Our Europium Nitride Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

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