Niobium Nitride Sputtering Target

 Description

Niobium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula NbN.

Niobium is a silver-colored metal that is generally found in conjunction with tantalum, the two elements being separated by fractional crystallization of their respective fluoro-complexes. It has an abundance of 20 ppm in the earth’s crust. As a pure metal, it is very reactive and forms an extremely stable oxide when exposed to air which enhances its corrosion resistance. Niobium will react with a variety of non-metals at elevated temperatures.

Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Niobium Nitride Sputtering Target Application

The niobium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Niobium Nitride Sputtering Target Packaging

Our niobium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.