Hafnium Nitride Sputtering Target

Description

Hafnium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula HfN.

Hafnium is a chemical element that originated from Copenhagen, Denmark (with the Latin name Hania). It was first mentioned in 1911 and observed by G. Urbain and V. Vernadsky. The isolation was later accomplished and announced by D. Coster and G. von Hevesy. “Hf” is the canonical chemical symbol of hafnium. Its atomic number in the periodic table of elements is 72 with the location at Period 6 and Group 4, belonging to the d-block. The relative atomic mass of hafnium is 178.49(2) Dalton, the number in the brackets indicating the uncertainty.

Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Hafnium Nitride Sputtering Target Application

The hafnium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Hafnium Nitride Sputtering Target Packaging

Our hafnium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.