Germanium Nitride Sputtering Target

Description

Germanium Nitride sputtering target from Stanford Advanced Materials is a nitride ceramic sputtering material with the formula Ge3N4.

Germanium is a chemical element originated from Germany (with the Latin name Germania). It was first mentioned in 1886 and observed by A. Winkler. “Ge” is the canonical chemical symbol of germanium. Its atomic number in the periodic table of elements is 32 with a location at Period 4 and Group 14, belonging to the p-block. The relative atomic mass of germanium is 72.64(1) Dalton, the number in the brackets indicating the uncertainty.

Nitrogen is a chemical element originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.

Germanium Nitride Sputtering Target Application

The germanium nitride sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Germanium Nitride Sputtering Target Packaging

Our germanium nitride sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.