Aluminum Nitride Sputtering Target
Description
Aluminum nitride sputtering target from Stanford Advanced Materials is a ceramic sputtering material with the formula AlN.
Aluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.
Nitrogen is a chemical element that originated from the Greek ‘nitron’ and ‘genes’ meaning nitre-forming. It was first mentioned in 1772 and observed by D. Rutherford. The isolation was later accomplished and announced by D. Rutherford. “N” is the canonical chemical symbol of nitrogen. Its atomic number in the periodic table of elements is 7 with a location at Period 2 and Group 15, belonging to the p-block. The relative atomic mass of nitrogen is 14.0067(2) Dalton, the number in the brackets indicating the uncertainty.
Aluminum Nitride Sputtering Target Specification
|
Compound Formula |
AlN |
|
Appearance |
White to pale yellow powder |
|
Melting Point |
2200 °C |
|
Boiling Point |
2517 °C |
|
Density |
2.9 to 3.3 g/cm3 |
|
Electrical Resistivity |
10 to 12 10x Ω-m |
|
Specific Heat |
780 J/kg-K |
Aluminum Nitride Sputtering Target Packaging
Our aluminum nitride sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.