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Sputtering Targets

Different Shapes of Sputtering Targets

(주)연진에스텍은 Planar (Flat) TargetRotary (Cylindrical) Target, Circular (Disc)TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 특이한 요청 시 타겟 크기의 커스터마이즈가 가능합니다.

 

Key Features

  • High Purity & Performance: 일관된 증착 품질과 오염을 줄이도록 가공합니다.
  • Material Variety: 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
  • Custom Manufacturing: 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
  • Precision Design: 반복 가능하고 균일한 박막 결과를 위해 엄격한 허용 오차로 제조되었습니다.
  • Flexible Supply Chain: 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.

 


NITRIDE TARGET

Boron Nitride (BN) Sputtering Target

 


 

Boron Nitride (BN) Sputtering Target

High Purity BN Ceramics for Thin-film Application

 

Stanford Advanced Materials (SAM) supplies high-purity boron nitride (BN) sputtering targets engineered for stable, high-efficiency thin film deposition. BN is a ceramic compound known for its exceptional thermal stabilityelectrical insulation, and non-stick properties, making it an ideal material for a wide range of advanced coating applications.

Our BN sputtering targets are offered in standard and customized dimensions, with optimized microstructure and density to ensure low particle generation and excellent film uniformity.

 

 

Boron Nitride Sputtering Target Specification

Property

Value

Material

Boron Nitride (BN)

Appearance

White, crystalline solid

Purity

99.5%, 99.9%

Melting Point

~3,000 °C

Theoretical Density

2.25 g/cm³

Sputtering Method

RF, RF-R

Bonding Options

Indium, Elastomer

Recommended Bonding

Elastomer (for thermal shock resistance)

Custom Sizes

Dia. 1″–6″, Thick. 0.125″–0.25″

Note: BN is a non-conductive ceramic and must be sputtered using RF power. It may decompose under aggressive conditions; use in reactive atmospheres is preferred.

 

Boron Nitride (BN) Sputtering Target Applications

Boron nitride sputtering targets are used in:

  • Semiconductor & Insulating Layers
    Ideal for gate dielectrics, passivation layers, and insulating films in IC and MEMS fabrication.

  • Display & LED Devices
    Optical and thermal barrier coatings in OLED, LCD, and laser diode manufacturing.

  • Photovoltaics & Transparent Electronics
    UV-resistant, thermally stable dielectric barriers.

  • High-Temperature Coatings
    Protective layers for crucibles, tools, and components operating above 1,500 °C.

  • Nanotechnology
    BN nanotubes and 2D h-BN layers offer high mechanical strength and thermal conductivity for next-gen devices.

 

Boron Nitride (BN) Sputtering Target Bonding Services

BN targets are typically bonded before installation to prevent cracking during sputtering. We offer:

  • Elastomer Bonding – Recommended for BN due to its brittleness and low thermal conductivity.

  • Indium Bonding – Optional, but use caution with high-temperature cycling.

  • Custom Backing Plates – Available in copper, molybdenum, stainless steel, and more.

 

 

Boron Nitride (BN) Sputtering Target Packaging

Each boron nitride target is vacuum-sealed and securely packaged with foam inserts in a clean environment to prevent contamination and mechanical damage. All shipments include full labeling and traceability.

 

 

 

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