Cobalt Ferrite Sputtering
Target Description
Cobalt ferrite sputtering target is composed of cobalt, iron and oxide with the chemical formula of CoFe2O4. High-purity cobalt ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Cobalt Ferrite Sputtering Target Specification
|
Material Type |
Cobalt Ferrite |
|
Symbol |
CoFe2O4 |
|
Color/Appearance |
Gray to black solid |
|
PH |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Target Bonding of Cobalt Ferrite Sputtering Target
Indium Bonding and Elastomeric Target Bonding Services are available for cobalt ferrite sputtering targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.
Packaging of Cobalt Ferrite Sputtering Target
Our cobalt ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.