Bismuth Manganate Sputtering
Target Description
Bismuth manganate sputtering target is composed of bismuth, manganese, and oxide with the chemical formula of Bi2.4MnO3. High-purity bismuth manganate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Bismuth Manganate Sputtering Target Specification
|
Material Type |
Bismuth manganate |
|
Symbol |
Bi2.4MnO3 |
|
Color/Appearance |
Black solid |
|
PH |
6.5 |
|
Density |
7.0 g/cm3 |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Bismuth Manganate Sputtering Target Packaging
Our bismuth manganate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.