Cerium Bismuth Ferrite Sputtering
Target Description
Cerium bismuth ferrite sputtering target is composed of bismuth, calcium, iron, and oxide with the chemical formula of Ce2.2Bi0.8Fe5O12. High-purity cerium bismuth ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Cerium Bismuth Ferrite Sputtering Target Specification
|
Material Type |
Cerium bismuth ferrite |
|
Symbol |
Ce2.2Bi0.8Fe5O12 |
|
Color/Appearance |
Solid |
|
Melting Point |
N/A |
|
Density |
N/A |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Cerium Bismuth Ferrite Sputtering Target Packaging
Our cerium bismuth ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.