Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
Tungsten Titanium (W/Ti) Sputtering Target
Tungsten Titanium Sputtering Target
Description
Delve into the exceptional properties of Tungsten Titanium Sputtering Targets and discover their wide-ranging applications across various industries. This page showcases the distinctive qualities of both Tungsten and Titanium integration in thin film deposition processes, illuminating a path to innovative solutions.
Tungsten: The Resilient Rare Metal
Tungsten, a rare metal, naturally occurs on Earth in compounds with other elements. It claims the title of having the highest melting point among all elements at 3422 °C, alongside the highest boiling point at 5930 °C. While polycrystalline tungsten exhibits brittleness and hardness, pure single-crystalline tungsten is more ductile and can be cut with precision.
Titanium: A Spectrum of Excellence
Titanium, with its lustrous transition metal properties, dons a silver hue, low density, and formidable strength. It resists corrosion in seawater, aqua regia, and chlorine, contributing to its exceptional versatility. Titanium sputtering targets take center stage in applications ranging from CD-ROMs and decorative pieces to flat panel displays and optical communication.
Tungsten Titanium Sputtering Target Specifications
|
Specification |
Details |
|---|---|
|
Material Type |
Tungsten Titanium |
|
Symbol |
W/Ti |
|
Color/Appearance |
Solid |
|
Available Sizes |
Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″. Thick: 0.125″, 0.250″. Custom shapes and sizes available on inquiry. |
|
Packing |
Targets are tagged and labeled externally for identification and quality control. Careful handling during storage and transportation. |
Tungsten Titanium Sputtering Target Applications
- Elevated Thin Film Deposition: Tungsten Titanium sputtering targets drive the creation of advanced thin films for various applications, ensuring precision and excellence.
- Strength in Diversity: The inclusion of Tungsten and Titanium enhances the material’s strength and versatility, fostering innovation.
- Advancing Industries: From semiconductor to optical applications, the integration of these elements fuels progress across industries.
Tungsten Titanium Sputtering Target Advantages
- Exceptional Resilience: The exceptional melting and boiling points of Tungsten alongside Titanium’s resilience amplify the durability of thin film depositions.
- Diverse Applications: The versatility of Tungsten Titanium sputtering targets spans applications ranging from precision cutting to optical communication.
- Innovation Catalyst: Integrating these elements ignites innovation in cutting-edge technologies across diverse sectors.
Unleash the potential of Tungsten Titanium Sputtering Targets and harness their remarkable properties for revolutionary applications. Contact us now to explore customized solutions that propel your innovation journey forward.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
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