Different Shapes of Sputtering Targets
(주)연진에스텍은 Planar (flat) Target과 Rotary (cylindrical) Target, Circular Target 및 Ring Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.
Tantalum Titanium (Ta/Ti) Sputtering Target
Tantalum Titanium Sputtering Target
Description
Embark on a journey through the remarkable qualities of Tantalum Titanium sputtering targets and explore their diverse applications across industries. This page unveils the distinctive properties and potential applications of integrating Tantalum Titanium into thin film deposition processes.
Tantalum: Enduring Corrosion Resistance
Tantalum, a rare and lustrous transition metal, possesses remarkable corrosion resistance. It belongs to the refractory metals group, often utilized as minor components in alloys. Its chemical inertness deems it valuable for laboratory equipment and a substitute for platinum. The use of Tantalum sputtering targets is prominent in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD) production.
Titanium: Versatility in Excellence
Titanium, with its silver color, low density, and high strength, is a lustrous transition metal known for resisting corrosion in challenging environments like seawater, aqua regia, and chlorine. Titanium sputtering targets play a vital role in CD-ROM production, decorative applications, flat panel displays, functional coatings, optical information storage, glass coating industries, optical communication, and more.
Tantalum Titanium Sputtering Target Specifications
|
Specification |
Details |
|---|---|
|
Material Type |
Tantalum Titanium |
|
Symbol |
Ta/Ti |
|
Color/Appearance |
Metallic solid in various forms including powder, sputtering target, foil, bar, plate |
|
Available Sizes |
Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″, Thick: 0.125″, 0.250″. Custom shapes and sizes available on inquiry. |
|
Packing |
Targets are tagged and labeled externally for identification and quality control. Careful handling during storage and transportation. |
Tantalum Titanium Sputtering Target Applications
- Thin Film Deposition: Tantalum Titanium sputtering targets are integral in producing thin films for integrated circuits, TFT-LCD, and a range of advanced applications.
- Coating Excellence: These sputtering targets contribute to superior CD-ROMs, decorative applications, and functional coatings for optical information storage and communication.
- Innovations Unleashed: Tantalum Titanium targets drive advancements in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD), and optical industries.
Tantalum Titanium Sputtering Target Advantages
- Unyielding Corrosion Resistance: Tantalum Titanium’s robust corrosion resistance enhances the durability and performance of thin film depositions.
- Versatile Applications: The wide range of applications, from advanced displays to optical communication, showcases the versatility of Tantalum Titanium sputtering targets.
- Innovative Potential: Leveraging Tantalum Titanium targets fuels innovation in cutting-edge technologies across multiple industries.
Discover the potential of Tantalum Titanium Sputtering Targets and unlock their exceptional properties for revolutionary applications. Contact us now to explore customized solutions that propel your innovation forward.
- High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다.
- Material Variety 다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다.
- Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다.
- Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다.
- Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다.
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