메뉴 건너뛰기

Sputtering Targets

Different Shapes of Sputtering Targets


(주)연진에스텍Planar (flat) TargetRotary (cylindrical) Target, Circular TargetRing Target 등 대부분의 증착 공정에 부합하는 다양한 형태의 스퍼터링 타겟을 제공하며, 타겟 크기의 커스터마이즈가 가능합니다.


 

Dysprosium-Iron (DyFe) Sputtering Target Description

 

 

Dysprosium-Iron Sputtering Target is a specialized material used in the sputtering process for thin film deposition. Sputtering involves bombarding a target material with high-energy ions, causing atoms to be ejected from the target surface. These ejected atoms then deposit onto a substrate, creating a thin film with specific properties.

Precision dysprosium and ferrous alloys are used to ensure that precise chemistry is achieved during sputtering, improving film performance and stability. Dysprosium-Iron Sputtering Targets provided by Stanford Advanced Materials (SAM) are rigorously prepared to provide exceptional high purity, helping to eliminate impurities and ensure film purity and uniformity. Dysprosium-Iron Sputtering Targets exhibit excellent electrical conductivity and support uniform deposition on the target surface, improving deposition efficiency and film quality. A stable crystal structure ensures outstanding performance over long periods, reducing equipment maintenance and extending service life.

 

 

Dysprosium-Iron (DyFe) Sputtering Target Specifications

Compound Formula

DyFe

Molecular Weight

Appearance

Black Target

Melting Point

Density

Available Sizes

Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

 

Thick: 0.125″, 0.250″

 

Dysprosium-Iron (DyFe) Sputtering Target Handling Notes

  1. Indium bonding is recommended for Dysprosium-Iron Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

 

Dysprosium-Iron (DyFe) Sputtering Target Application

  1. Magnetic storage technology: Due to their high-quality magnetic properties, Dysprosium-Iron Sputtering Targets are widely used in the preparation of magnetic disks and magnetic sensors, increasing storage density and sensor performance.
  2. Magnetic Sensor Manufacturing: Used in the production of high-performance magnetic sensors, for example in navigation systems and magnetometers, to ensure sensitivity and accuracy.
  3. Optical thin-film technology: Dysprosium-Iron Sputtering Targets are used to deposit magnetic thin films in the manufacture of lasers and optical devices, enabling precise control of optical properties.
  4. Electronic component applications: Used in the preparation of advanced electronic components such as magnetoresistors and magneto-electric inductors, providing high-performance materials for the electronics industry.

 

Dysprosium-Iron (DyFe) Sputtering Target Packaging

Our Dysprosium-Iron Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

 

 

 

 

  • High Purity & Performance 일관된 증착 품질과 오염을 줄이도록 가공합니다. 
  • Material Variety  다양한 응용 분야의 요구 사항에 맞게 순수 금속, 합금, 세라믹 및 화합물로 제공됩니다. 
  • Custom Manufacturing 특정 시스템의 필요요구 사항에 맞게 크기와 형태, 조성을 맞춤화했습니다. 
  • Precision Design 반복 가능하고 균일한 박막 결과를 위해 엄격한 공차로 제조되었습니다. 
  • Flexible Supply Chain 최고의 제조업체와 강력한 파트너십을 통해 일관된 품질과 on-time 납품을 보장합니다. 


INQUIRY

견적문의

문의사항이 있으신가요?
궁금하신 내용을 남겨주시면 담당 부서에서 확인 후 답변 드리겠습니다.

 

문의
하기