(주)연진에스텍 진공증착 소스
Gencoa의 Rectangular 혹은 Rotatable Magnetron Source는 Speedflo 공정 컨트롤러 및 Optix RGA 센서와 같은 공정 툴과 함께 사용가능합니다.
In nearly all cases it is possible to fit our standard balanced (SW) or unbalanced (PP) magnetic systems. In 70% of cases it is possible to fit our high yield (HY) type magnetics.
The possible reasons to replace magnets are include the following:
- Defective magnets
- Corrosion of magnets located in water (very common)
- Over-heating and degaussing of the magnets
- To increase target utilization
- To increase magnetic field strength for low pressure/voltage or magnetic material sputtering
- To improve coating uniformity in both circular and rectangular geometries
- To enhance plasma reactivity and energy by unbalancing the magnetic field
- To reduce arcing by avoiding closed magnetic field interactions with system anodes
- To achieve cleaner targets, especially in reactive sputtering
Rotatable Magnetron
The Gencoa Rotatable System (GRS) family of rotatable magnetrons covers four styles of end-block, with two options of internal flange mount style, and options for horizontal cantilever and vertical mounted rotatables. .. more
Circular Magnetron
Gencoa offer a comprehensive range of circular magnetrons, catering for applications from R&D to semiconductor production. A wide selection of configurations result in solutions for challenging demands of real processes. ..more
Rectangular Magnetron
Gencoa have a well-established track record of providing rectangular planar magnetrons and technology for coating of flexible substrates, architectural glass, solar cells, displays, touch screens and semiconductor wafers. In particular, the electrical insulation of our cathodes mean we are the partner of choice for any high power RF or HIPIMS application. .. more
Plasma Sources
Gencoa provide a range of plasma source technology based upon DC, AC and HIPIMS power modes, and for applications including pre-cleaning, coating removal and ion beam deposition. .. more
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