(주)연진에스텍 진공증착 소스
Gencoa의 Rectangular 혹은 Rotatable Magnetron Source는 Speedflo 공정 컨트롤러 및 Optix RGA 센서와 같은 공정 툴과 함께 사용가능합니다.
3G Circular
Gencoa's third generation range of small circular magnetrons - available in target diameters of 2" to 5" - are designed to operate under a low pressure range, and include ±45° tilt adjustment, gas injection and a rear utility box for DC, DC-pulsed, RF and HIPIMS processes as standard.
The 3G circular range of HV sources from Gencoa caters for applications from R&D to small scale production.
With minimal use of polymer and newly-developed magnetics, the sources can perform in the 10-6 Torr range, delivering improvements to the deposition rate, reduced arcing, fewer impurities and a higher density coating.
The sources can be fitted with a choice of magnetic and mechanical options, leading to performance benefits appropriate for differing applications, and are built to reliably work with DC, RF, pulsed DC and HiPIMS power supplies.
High yield (HY) magnetics can be fitted to target diameters of 4” and above for sputtering of precious metals, delivering target usage of 40%.
Key features
- Low pressure sputtering (10-6 to 10-2 torr)
- ± 45º tilt angle adjustment (1° accuracy)
- Standard target sizes
- High yield (HY) magnetics available for 4" and 5" target diameters, delivering >40% target usage
- Internal gas injection as standard
- Rear utility box as standard for RF and HIPIMS
- Easy target change and choice of target thickness (1-6mm)
- High strength magnetics for sputtering of magnetic material
- Indirect or direct target cooling (pre-configured)
Mechanical options
All magnetrons in the 3G circular range are available for internal or external mount, with the following additional options: manual or pneumatic shutter, chimney, wallmount feedthrough, hidden/water-cooled anode.
Dimensions
The table below shows the different options of 3G circular magnetrons, along with each of the included mechanical options. Click on the PDF icons to download dimensional drawings for the required target size.
| Tilt | Gas injection | Utility box | 2" | 3" | 4" | ||
|---|---|---|---|---|---|---|---|
| 3G | Internal | • | • | • |  |
|
|
| 3G-A | Internal | • | • | |
|
|
|
| 3G-B | Internal | • | |
|
|
||
| 3G-C | Internal | • | • | |
|
|
|
| 3G-E | External | • | |
|
|
- showThumb (8).jpg (1.51kB)
- showThumb (3).jpg (1.99kB)
- showThumb (16).jpg (1.77kB)
- showThumb (14).jpg (2.22kB)
- showThumb (15).jpg (2.21kB)
- showThumb (13).jpg (2.42kB)
- showThumb (7).jpg (1.90kB)
- showThumb (9).jpg (1.40kB)
- showThumb (11).jpg (2.73kB)
- showThumb (1).jpg (2.11kB)
- showThumb (10).jpg (1.62kB)
- showThumb (5).jpg (2.80kB)
- showThumb (12).jpg (1.93kB)
- showThumb (4).jpg (1.76kB)
- showThumb (2).jpg (1.70kB)
- showThumb.jpg (1.79kB)
- showThumb (6).jpg (3.10kB)
- circular-3g.jpg (6.34kB)
Rotatable Magnetron
The Gencoa Rotatable System (GRS) family of rotatable magnetrons covers four styles of end-block, with two options of internal flange mount style, and options for horizontal cantilever and vertical mounted rotatables. .. more
Circular Magnetron
Gencoa offer a comprehensive range of circular magnetrons, catering for applications from R&D to semiconductor production. A wide selection of configurations result in solutions for challenging demands of real processes. ..more
Rectangular Magnetron
Gencoa have a well-established track record of providing rectangular planar magnetrons and technology for coating of flexible substrates, architectural glass, solar cells, displays, touch screens and semiconductor wafers. In particular, the electrical insulation of our cathodes mean we are the partner of choice for any high power RF or HIPIMS application. .. more
Plasma Sources
Gencoa provide a range of plasma source technology based upon DC, AC and HIPIMS power modes, and for applications including pre-cleaning, coating removal and ion beam deposition. .. more
하기