Zinc Oxide with Manganese Sputtering
Target Description
Zinc Oxide with Manganese Sputtering Target is composed of zinc, manganese, and oxygen. High-purity zinc oxide with manganese sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Zinc Oxide with Manganese Sputtering Target Specification
|
Material Type |
Zinc Oxide with Manganese |
|
Symbol |
ZnO 0.3 wt% Mn |
|
Color/Appearance |
Solid |
|
Melting Point |
/ |
|
Density |
/ |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Zinc Oxide with Manganese Sputtering Target Application
Zinc Oxide with Manganese Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Zinc Oxide with Manganese Sputtering Target Packaging
Our Zinc Oxide with Manganese Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.