Titanium Ferrite Sputtering
Target Description
Titanium Ferrite Sputtering Target is composed of titanium, iron, and oxygen. High-purity titanium ferrite sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Titanium Ferrite Sputtering Target Specification
|
Material Type |
Titanium Ferrite |
|
Symbol |
TiFe2O4 |
|
Color/Appearance |
Solid |
|
Melting Point |
/ |
|
Density |
7.35 g/cm3 |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Titanium Ferrite Sputtering Target Application
Titanium Ferrite Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Titanium Ferrite Sputtering Target Packaging
Our Titanium Ferrite Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.