Sodium Niobate Sputtering
Target Description
Sodium Niobate Sputtering Target is composed of sodium, niobium, and oxygen. High-purity sodium niobate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Sodium Niobate Sputtering Target Specification
|
Material Type |
Sodium Niobate |
|
Symbol |
NaNbO3 |
|
Color/Appearance |
Solid |
|
Melting Point |
/ |
|
Density |
4.42 g/cm3 |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Sodium Niobate Sputtering Target Application
Sodium Niobate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Sodium Niobate Sputtering Target Packaging
Our Sodium Niobate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.