Titanium Silicate Sputtering
Target Description
Titanium Silicate Sputtering Target is composed of titanium, silicon, and oxygen. High-purity titanium silicate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Titanium Silicate Sputtering Target Specification
|
Material Type |
Titanium Silicate |
|
Symbol |
Ti0.44Si0.10O |
|
Color/Appearance |
Solid |
|
Melting Point |
/ |
|
Density |
/ |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Titanium Silicate Sputtering Target Application
Titanium Silicate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Titanium Silicate Sputtering Target Packaging
Our Titanium Silicate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.