Strontium Niobium Titanate Sputtering
Target Description
Strontium Niobium Titanate Sputtering Target is composed of strontium, niobium, titanium, and oxygen. High-purity strontium niobium titanate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Strontium Niobium Titanate Sputtering Target Specification
|
Material Type |
Strontium Niobium Titanate |
|
Symbol |
SrNb(1-x)TixO3 |
|
Color/Appearance |
Solid |
|
Melting Point |
/ |
|
Density |
/ |
|
Type of Bond |
Elastomer, Indium |
|
Available Sizes |
Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Strontium Niobium Titanate Sputtering Target Application
Strontium Niobium Titanate Sputter Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Strontium Niobium Titanate Sputtering Target Packaging
Our Strontium Niobium Titanate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.