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Swiss Cluster SC-1

2022-07-22 21:17:17 297

ALD+PVD in a compact and modular system

⎯⎯

SC-1 Series

The SC-1 is the first compact cluster system combining Atomic Layer Deposition (ALD) and Physical Vapor Deposition (PVD).

This system is designed for ultimate modularity and flexibility to quickly adapt to changing research needs and future projects.

Add new gas lines, valves, and mass flow controllers; customize flanges and feedthroughs; exchange substrate holders or incorporate microwave plasma sources and in situ metrology tools. The SC-1 ALD+PVD

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Adapt and upgrade as needed

+ + + +

Main System

• Reactors ALD standalone / PVD standalone / ALD+PVD cluster

• ALD lines Standard Lines and Bubblers - Up to 12 precursors with individual inlets

• Sputtering Sources Up to 4 sputtering sources of 2 inch targets. Commercial and customized sources. HiPIMS compatible

Components

• Stage Holders Wafers: High Temperature Stage / Rotational and z-stage / Temperature Gradient Stage (30 - 450ºC) / Customized stage holder.
3D objects: Customized holder frames.

• Microwave Plasma Sources Plasma-Enhanced ALD, Microwave Assisted Reactive Sputtering for PVD

• In Situ Metrology In-situ stress measurements

Temperature Gradient Stage (Swiss Cluster)

MW Plasma Source (SAIREM)

In Situ Stress Measurement System (Vajotec)

Get your grain growth under control

• • • •

Thin film engineering at its best. Fabricate single to complex multinanolayered coatings for many applications in semiconductor, solar cells and batteries, optics, decorative and hard coatings, corrosion and high temperature resistant coatings and many other.

The precise grain size control in thin film coatings delivered by the SC-1 can increase the hardness and yield strength of many materials. As in this case study of 200 alternating nanolayers with 20 nm of PVD Al & 1 nm of ALD Al₂O₃. This brick-and-mortar structure can increase the hardness and yield strength of aluminum by 6x!

TEM images of a ~2.6 um thick film of a multinanolayer composed of 100 layers of 25 nm of PVD aluminium alternating with 1 nm of ALD Al₂O₃. Images courtesy of Empa.

Nanomechanical mapping of the PVD/ALD Al-Al₂O₃ nanostructured multinanolayer film to determine the enhancing effect of thin ALD films. Image courtesy of Empa.

당사 (주)연진에스텍은 Swiss Cluser AG사의 한국 에이전트로써,

Swiss Cluster사의 독특한 최신의 ALD+PLD 시스템을 홍보하고자 본 메일을 발송하게 되었습니다.

견적 문의해주시면 빠르게 준비해드리겠습니다.

Tel: 02-2675-0567 E-mail: sales@yeonjin.com

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YEONJIN S-Tech Corporation 2022-10-27 15:28:05 227 0
Swiss Cluster SC-1

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YEONJIN S-Tech Corporation 2022-07-22 21:17:17 297 0

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