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스퍼터링 타겟(스퍼터링 타겟)

Manganese Oxide Sputtering Target, Mn2O3 Manganese Oxide Sputtering Target Description Manganese Oxide Sputtering Targets (Mn2O3) are essent
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142

스퍼터링 타겟(스퍼터링 타겟)

Lanthanum Strontium Cobalt Oxide Target (LSCO) LSCO Product Overview The Lanthanum Strontium Cobalt Oxide (LSCO) Target is engineered for high-per
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115

Genco 진공 증착소스 및 공정제어(Genco 진공 증착소스 및 공정제어)

Active anode Planar magnetrons have the surrounding dark space shield to collect the plasma electrons. A rotatab
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177

Genco 진공 증착소스 및 공정제어(Genco 진공 증착소스 및 공정제어)

Retrofit magnetics In nearly all cases it is possible to fit our standard balanced (SW) or unbalanced (PP) magnetic sy
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136

Genco 진공 증착소스 및 공정제어(Genco 진공 증착소스 및 공정제어)

Circular FFE Circular FFE Two versions of the circular FFE are available, with a unique design for target diamet
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129

스퍼터링 타겟(스퍼터링 타겟)

Lithium-rich Lithium Cobalt Oxide Target (Li1+xCoO2) Li1+xCoO2 Product Overview Stanford Advanced Materials (SAM) presents the Lithium-rich Lithium Coba
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98

스퍼터링 타겟(스퍼터링 타겟)

Aluminum-doped Lithium Cobalt Oxide (AlLiCoO2) AlLiCoO2 Product Overview Stanford Advanced Materials (SAM) introduces the Aluminum-doped Lithium C
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125

스퍼터링 타겟(스퍼터링 타겟)

Barium Strontium Titanate Target (BaSrTiO3) (BST) BaSrTiO3 Product Overview Stanford Advanced Materials (SAM) presents the Barium Strontium Titanate
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102

동영상 자료

Planar Biaxial Test Machine for Tension - Tension Fatigue | TestResources
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120

Genco 진공 증착소스 및 공정제어(Genco 진공 증착소스 및 공정제어)

Circular VTech Circular VTech Gencoa's VTech range is available for target diameters of 2" to 6" and allow the magn
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