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스퍼터링 타겟(스퍼터링 타겟)

Tungsten Carbide (WC) Sputtering Target Tungsten Carbide Sputtering Target Description Tungsten, also called wolfram, is a chemical element
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298

스퍼터링 타겟(스퍼터링 타겟)

Titanium Carbide (TiC) Sputtering Target Titanium Carbide Sputtering Target Description Titanium is a chemical element that originated from
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333

스퍼터링 타겟(스퍼터링 타겟)

Tantalum Carbide Sputtering Target, TaC Tantalum Carbide Sputtering Target Description Tantalum is a chemical element that originated from
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282

스퍼터링 타겟(스퍼터링 타겟)

Silicon Carbide Sputtering Target, SiC Silicon Carbide Sputtering Target Description Silicon is a chemical element that originated from th
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358

스퍼터링 타겟(스퍼터링 타겟)

Niobium Carbide Sputtering Target, NbC Niobium Carbide Sputtering Target Description Niobium is a silver-colored metal that is generally f
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308

스퍼터링 타겟(스퍼터링 타겟)

Molybdenum Carbide Sputtering Target, Mo2C Molybdenum Carbide Sputtering Target Description Molybdenum is a chemical element that originated f
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302

스퍼터링 타겟(스퍼터링 타겟)

Iron Carbide Sputtering Target, Fe3C Iron Carbide Sputtering Target Description Iron, also called ferrum, is a chemical element originat
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301

스퍼터링 타겟(스퍼터링 타겟)

Chromium Carbide Sputtering Target, Cr3C2 Chromium Carbide Sputtering Target Description Chromium Carbide sputtering target from Stanford Adv
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305

스퍼터링 타겟(스퍼터링 타겟)

Boron Carbide (B4C) Sputtering Target Boron Carbide Sputtering Target Description Boron is a chemical element that originated from the Ar
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395

스퍼터링 타겟(스퍼터링 타겟)

Aluminum Oxide Sputtering Target, Al2O3 We offers high-purity aluminum oxide (Al₂O₃) sputtering targets, also known as alumina sputtering t
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385

증착재료 도가니(박막증착 도가니 (Evaporation Crucibles))

Quartz Crucible for Single Crystal Silicon pulling Quartz Crucible for Single Crystal Silicon pulling is a specialized piece of equipment made from fu
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621

증착재료 도가니(박막증착 도가니 (Evaporation Crucibles))

Boron Nitride Crucible, BN Crucible Boron Nitride Crucible, BN Crucible Catalog No. BN1662 Size Various Material Pure composite boron ni
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