We are a professional supplier of PVD coating materials, we are engaged in supplying the most suitable and high quality evaporation materials. Sputtering is a physical vapor deposition (PVD) process used for depositing materials onto a substrate, by ejecting atoms from sputtering targets and condensing the ejected atoms onto a substrate in a high vacuum environment. According to the target chemical composition, sputtering targets can be divided into 3 types: 1. Metal sputtering targets, 2. Alloy sputtering targets, 3. Ceramic sputtering targets.

Different Shapes of Sputtering Targets

We offer sputtering targets in a range of shapes to suit various deposition setups:

• Planar (Flat) Targets: Standard for most magnetron sputtering systems.

• Rotary (Cylindrical) Targets: Ideal for high-throughput, large-area coating.

• Disc & Circular Targets: Common in small-area and R&D setups.

• Ring Targets: Frequently used in advanced magnetron configurations.

• Custom Geometries: Available for non-standard chambers or unique requirements.

What is a Sputtering Target?

A sputtering target is a solid material—metal, alloy, or ceramic—used in physical vapor deposition (PVD) systems. When exposed to a high-energy plasma in a vacuum, atoms from the target are ejected and form a thin, uniform film on the surface of a substrate. These films are essential in microelectronics, photovoltaics, optics, and protective coatings.

Physical vapor deposition (PVD) is a vaporization coating technique, to deposit materials such as metals, ceramics, and plastics onto a surface (substrate) and to form a thin film.  In general, it can be divided into two groups: sputtering and evaporation.

Sputtering is a physical vapor deposition (PVD) process used for depositing materials onto a substrate, by ejecting atoms from sputtering targets and condensing the ejected atoms onto a substrate in a high vacuum environment.

According to the target chemical composition, sputtering targets can be divided into 3 types:

1) Metal sputtering targets

We can produce and supply most of the metal materials on the periodic table, including rare earth metals. The production technology we generally use is vacuum melting and hot pressed sintering. By controlling the technical specifications of the process of forging, rolling and annealing, the finished sputtering target has the characteristics of high density, low gas content, uniform internal structure, the end user can obtain constant erosion rates and high pure and homogeneous thin films during the PVD process.  Discover a wide variety of metal targets suitable for depositing thin films in electronics, optics, energy, and more.

2) Alloy sputtering targets

We have the technology and expertise to get the job done no matter what your requirements may be. We pride ourselves on being the go-to source for custom alloys and high purity metals. It's our goal to always provide the best quality to our customers. Explore alloy targets designed to impart specific characteristics and functionalities to thin films, enhancing their performance in diverse applications.

3) Ceramic sputtering targets

We have extensive experience in the manufacture of ceramics and produce oxide and non-oxide ceramics as sputter targets for the coating industry, as well as metals and alloys. With the manufacture of targeted mixtures, the hardness, chemical resistance and visual properties, for example, can be broadly adapted to suit the specific wishes of the customers.

A further important area is mixtures of ceramic materials and metals, so-called cermets. We have the whole value chain in house: from the treatment of raw materials to the manufacture of the ceramics, the processing right up to bonding the targets. Experience the precision of ceramic targets, vital for producing thin films with exceptional hardness, wear resistance, and thermal properties.

Key Features

• High Purity & Performance: Materials engineered for consistent deposition quality and minimal contamination.

• Material Variety: Available in pure metals, alloys, ceramics, and compounds for diverse application requirements.

• Custom Manufacturing: Tailored sizes, shapes, and compositions to match specific system needs.

• Precision Design: Manufactured with exacting tolerances for repeatable, uniform thin-film results.

• Flexible Supply Chain: Strong partnerships with top manufacturers ensure consistent quality and on-time delivery.

How to check the quality of sputtering targets? The following 4 key factors are Highly concerned. 

✔ Materials Purity: the higher the better

✔ Gas Content: the lower the better

✔ Density: the higher the better

✔ Inner structure: homogeneous microstructure with fine grain size would be better

The main production technology we are using are vacuum induction melting and hot pressing, including hot isostatic pressing (HIP), we will choose the suitable process considering the target materials properties, as well as customer’s requirement.

Benefit from rich production experience and mature technology, the sputtering target we manufactured have ultra high purity with low gas content, very high density, as well as homogeneous microstructure with around 100um average grain size, to ensure the end user to obtain excellent performance thin films.

Except sputtering targets for mass production, we also have production line for small sputtering target for R&D purpose. Available sizes are 1”-4” diameter, and the composition can be customized without MOQ.

For fragile and soft materials especially ceramic sputtering targets and soft metals sputtering targets, we supply indium bonding service and elastomer bonding service on copper backing plate. The backing plate is not only a support to the targets materials, but also provide heat extraction(cooling) from sputtering process, as well as sealing from magnetron cooling system and vacuum chamber. Regarding ceramic targets, we suggest customer buy bonded targets from us, to avoid cracking risky by bonding by yourself.

Applications by Industry

Semiconductors & Electronics

• IC fabrication, diffusion barriers, conductive and insulating films.

Display Technologies

• Coatings for LCD, OLED, and touchscreens, including transparent conductors.

Solar & Renewable Energy

• Thin-film solar cells (CIGS, CdTe), transparent conductive oxides (TCOs).

Optics & Photonics

• Anti-reflective, mirror, and filter layers on lenses and precision glass.

Automotive & Aerospace

• Wear-resistant or decorative coatings on engine parts, tools, and structures.

Medical & Research

• Thin films for biosensors, diagnostic tools, and implant surface engineering.

Data Storage

• Magnetic and protective coatings for hard drives and memory components.

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