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Classic Method에 의한 마찰특성 측정 Classic Method에 의한 마찰특성 측정 2 kg의 추(weight)를 이용하는 Classic Method에 의한 장비 구매 가능합니다. 동일한 장비 구성으로 Method

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3G Circular 3G Circular Gencoa's third generation range of small circular magnetrons - available in target diame

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Zirconium (Zr) Evaporation Materials Description: High purity evaporation materials play a huge role in deposition processes to ensure h

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미세 인장압축 강도 측정기 Micro Tensile / Compression Testing Equipment TXA™ 시리즈는 하이드로겔 및 PDMS와 같이 매우 연질한 시료와 부스러지기 쉬운 brittle

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Strontium Zirconate Sputtering Target, SrZrO3 Strontium Zirconate Sputtering Target Description Strontium zirconate sputtering target from Stanfo

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Tantalum Oxide Sputtering Target, Ta2O5 Tantalum Oxide Sputtering Target Description Tantalum is a chemical element that originated from Ki

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Thulium Oxide Sputtering Target, Tm2O3 Thulium Oxide Sputtering Target Description Thulium is a chemical element that originated from Thul

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Tin Oxide Sputtering Target, SnO2 Tin Oxide Sputtering Target Description Tin oxide sputtering target from Stanford Advanced Material

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Titanium Trioxide Sputtering Target, Ti2O3 Titanium Trioxide Sputtering Target Description Titanium trioxide sputtering target from Stanford A

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Titanium Pentoxide Sputtering Target, Ti3O5 Titanium Pentoxide Sputtering Target Description Titanium Pentoxide sputtering target, provided by

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Titanium Dioxide Sputtering Target, TiO2 Titanium Dioxide Sputtering Target Description Titanium dioxide sputtering target from Stanford Adv

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Titanium Monoxide Sputtering Target, TiO Titanium Monoxide Sputtering Target Description Titanium monoxide sputtering target from Stanford A

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