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Enhancing PVD Processes Through Substrate Biasing Techniques PVD, or physical vapour deposition, is a technique for applying very thin coatings to materials such

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Optimising Film Uniformity With Substrate Heating in PVD If you’re unfamiliar with physical vapour deposition (PVD), here is a brief explanation. PVD is a pr

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What Is Pulsed DC Sputtering? Pulsed direct current (DC) magnetron sputtering is a physical vapour deposition technique for deposi

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Physical Vapour Deposition | PVD for Electrical Contacts Physical vapour deposition (PVD) has become an integral technique in the manufacture of numerous goo

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M06T Manual Hall Effect Station M06T Manual Hall Effect Station Manually operated Hall Effect station compatible with INSTEC -PMH H

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Hall Effect measurment system HP1000V-MPSH // INS2408589 Hall Effect measurment system HP1000V-MPSH // INS2408589 RT to 1000°C Hall Effect Station Integrated

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H91 Hall Effect Measurement System H91 Hall Effect Measurement System Complete Hall-effect measurment system Options for temperature-co

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Gold (Au) Crucible A Gold Crucible is a high-purity, corrosion-resistant container made of gold, ideal for melting, re

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Compound Target Compound Target (주)연진에스텍에서 공급하는 진공박막증착공정용 coumpound 제품은 다양한 산업 및 연구 분야에 맞게 제작됩니다. 당사 컬렉션에는 고객의 요구사항에

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Zinc Oxide with Alumina Sputtering Target, ZnO/Al2O3 Zinc Oxide with Alumina Sputtering Target Description Zinc Oxide with Alumina sputtering target fro

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Calcium Zirconate Sputtering Target, CaZrO3 Calcium Zirconate Sputtering Target Description Calcium is a chemical element originated from the L

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Calcium Ruthenate Sputtering Target, CaRuO3 Calcium Ruthenate Sputtering Target Description Calcium is a chemical element originated from the L

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