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MBE, Molecular Beam Epitaxy System

Dr. Eberl MBE-Komponenten GmbH, Germany

Source Clusters

Source Clusters

DCS, Dual Cluster Source

DCS 40-2x1-14-2S Dual Cluster Source on a DN40CF (O.D. 2.75'') flange with two individual shutters and integrated water cooling
  • Cluster sources increase the capacity of UHV systems
  • Customized with two independent and different types of effusion cells on a single flange
  • Two individual shutters or multi-position shutter and additional cool tube available
  • Minimized temperature crosstalk because of effective integrated water cooling
  • Various crucible types and sizes available
  • Very compact cell design
  • Surprisingly low power consumption

Data Sheet

 

QCS, Quad Cluster Source

QCS 40-4x1-12 Quad Cluster Source on DN40CF flange with multi-position rotary shutter

 
  • Source clusters increase the capacity of MBE systems
  • 4 cells on one DN40CF (2.75") flange or DN63CF (4.5") flange
  • Very compact cell design
  • Various crucible types and sizes available
  • Integrated water cooling
  • Multi-position shutter for QCS 40 and QCS 63

Data Sheet

DDS, Dual Doping Source

DDS 63-2x2-16-2S Dual Doping Source for Si and Be on one DN63 CF flange, with two 2 cm3 crucibles, individual cell shutters and water cooling shield between the cells

 
  • Cluster sources increase the capacity of UHV systems
  • Customized designs with all kind of effusion cells
  • Compact and intelligent cell design
  • Various crucibles available
  • Solutions with integrated cooling shrouds and shutters

Data Sheet

Customized Source Clusters, Individual and particular cases

Special 90° source cluster with two individual linear shutters, mounted on a DN100CF flange.

 
  • Large variety of particular case sources available
  • Customized solutions with special designs
  • Close collaboration with customers
  • Consideration of special customomers' needs
  • Manifacturing of every practicable request
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