AT810 8 inch Thermal ALD

ALD, Atomic Layer Deposition Systems

Home > Products > 진공증착장비 (Vacuum Deposition System) > ALD Atomic Layer Deposition System > Anric ALD Equipment

Small Footprint Desktop System
Semiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.
Ultrafast MFC for integrated inert gas purge.
8″ circular chuck customizable for smaller sizes or other shapes.
3 organometallic precursors and 2 (up to 3) counter reactants.
Heated lines throughout (from precursor to chamber).
All aluminum (semiconductor grade) chamber ‒ range up to 300°C
7” touchscreen PLC controller (no PC required).

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