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ALD, Atomic Layer Deposition Systems

ANRIC Technologies, USA

AT610 6 inch Thermal ALD

The AT610 is the most cost-effective 6″ thermal ALD tool on the market. 

  • Small Footprint Desktop System
  • Semiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.
  • Ultrafast MFC for integrated inert gas purge.
  • 6 inch circular chuck (up to 7″ square) customizable for smaller sizes or other shapes (11 mm tall).
  • 3 organometallic precursors and 2 (up to 3) counter reactants.
  • Heated lines throughout (from precursor to chamber).
  • All aluminum (semiconductor grade) chamber ‒ range up to 310°C
  • 7” touchscreen PLC controller (no PC required).


 


 

 
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