AT 200M – The Most Cost Effective ALD System on the Market
Anric Technologies introduces the smallest footprint ALD (Atomic Layer Deposition) tool available on the market. The AT200M is small enough to fit in a glovebox and therefore the perfect solution for moisture or air-sensitive depositions.
- Small footprint (~ 15 in3 or 38.1 cm3)
- One precursor and one counter-reactant
- Semiconductor grade components
- Metal-sealed lines
- Vented precursor enclosure
- High temperature compatible, fast pulsing ALD valves with an ultra fast MFC for integrated inert gas purge
- Precursors (up to 145°C) , manifold, chamber heated to insure no condensation.
- Robust PLC driven user interface
- Stainless steel chamber can be heated to 290°C.
