The AT410 is the most cost-effective thermal ALD tool on the market.
- Small Footprint Desktop System
- Semiconductor-grade metal sealed lines and high temperature compatible fast pulsing ALD valves.
- Ultrafast MFC for integrated inert gas purge.
- 4″ circular chuck customizable for smaller sizes or other shapes (11 mm tall).
- 3 organometallic precursors and 2 (up to 3) counter reactants.
- Heated lines throughout (from precursor to chamber).
- All aluminum (semiconductor grade) chamber ‒ range up to 320°C
- 7″ touchscreen PLC controller (no PC required)
